Effect of pH Value and Electrolyte Concentration on the Copper Sulphide Thin Films Prepared by Chemical Bath Deposition Method

Authors : Anuar KASSİM, Saravanan NAGALINGAM, Tan TEE, Khor KOON, Ho MIN

Pages : 435-443

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Publication Date : 2010-03-25

Article Type : Other Papers

Abstract :Thin films of copper sulphide were deposited using   chemical bath deposition method. The deposition was carried out at various pH values and electrolyte concentrations. The structure, morphology and optical properties of thin films were investigated by means   of X-ray diffraction, atomic force microscopy and UV-Visible spectrophotometer. X-ray diffraction patterns confirmed that the   deposited materials were CuS with hexagonal phase. The films deposited using 0.05 M of copper chloride and sodium thiosulfate solutions at pH 3 showed the best crystallinity, uniform surface coverage and high absorption characteristics. The band gap was found to be 2.6 eV with p-type behaviour.   Key Words: Copper sulphide, Chemical bath deposition, thin films, X-ray diffraction.  
Keywords : Copper sulphide, Chemical bath deposition, thin films, X ray diffraction