CHARACTERIZATION OF PLAIN AND BORON INTERFACE METAL/p-Si SOLAR CELLS OBTAINED BY SPUTTER METHOD

In this study, 1.167 mg/ml was prepared with Boric acid in deionized water. Using this solution, Boron coating was made on a molybdenum foil by electrochemical coating method and this coating was confirmed with SEM images. Then, the Si wafer made of p-type ohmic contact with a carrier density of 1014 to 1018 (1,0,0) orientation was divided into two and this solution was coated on one of them by electrochemical method.