The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique

Authors : Beyhan TATAR, Canan YÖNEY, Dilek DEMİROĞLU

Pages : 52-56

View : 17 | Download : 9

Publication Date : 2018-08-06

Article Type : Research Paper

Abstract :T he molybdenum trioxide MoO 3 thin films were growth on c-Si substrates by magnetron sputtering technique. The structural and morphological properties of MoO 3 thin films were investigated by XRD, RAMAN and SEM analysis. Prior to annealing process, X-ray diffractogram indicated that MoO 3 thin films vere amorphous nature. All of the MoO 3 thin films were applied three different annealing temperature and obtained optimum annealing temperature with 300 0 C. XRD patterns of annealed thin films showed that these MoO 3 thin films have polycrystalline nature with 2 θ peak at 12 ˚ ,23 ˚ , 25 ˚ , 38 ˚ , 55 ˚ and 58 ˚ corresponding to the insert ignore into journalissuearticles values(020);, insert ignore into journalissuearticles values(110);, insert ignore into journalissuearticles values(040);, insert ignore into journalissuearticles values(060);, insert ignore into journalissuearticles values(112); and insert ignore into journalissuearticles values(081); planes .  RAMAN spectrum of the MoO 3 thin films were determined 1 4 Raman active peaks belong to α -phase MoO 3 . The surface morphology of the MoO 3 thin films as deposited has appeared to be uniform with smaller grains and exhibits a coarse structure. Annealing of the MoO 3 thin films favors growth and agglomeration of small grains.
Keywords : MoO3 thin films, Metal oxide semiconductors, Surface Properties, Structural Properties