Systematic optimization of chemical deposition conditions for synthesis of vanadium(V) oxide xerogels

Authors : Aksu SAMET, Metodija NAJDOSKI, IGOR KUZMANOVSKI

Pages : 136-146

View : 13 | Download : 9

Publication Date : 0000-00-00

Article Type : Research Paper

Abstract :We performed the optimization of conditions in chemical bath deposition using the design of experimental methodology. Factorial design insert ignore into journalissuearticles values(2$^{3});$ was used for finding the optimal conditions of preparing vanadiuminsert ignore into journalissuearticles values(V); oxide xerogel thin films with better electrochromic properties suitable for electrochemical applications. The thin films were prepared by acidification of NH$_{4}$VO$_{3}$ aqueous solution with chemical bath deposition. The factors and selected values we considered were as follows: the deposition time insert ignore into journalissuearticles values(10 and 20 min);, the deposition temperature insert ignore into journalissuearticles values(70 and 80 $^{\circ}$C);, and the mass of ammonium metavanadate insert ignore into journalissuearticles values(0.3 and 0.5 g);. UV-vis spectrometry was used for recording the transmittance variance, $\Delta T$, as the property of interest for modeling in this work. Increasing the deposition temperature and time values led to an increase in the value of $\Delta T $ at 800 nm wavelength, but the mass of NH$_{4}$VO$_{3}$ showed the opposite effect. Modeling performed using a 2$^{3}$ factorial design showed that the concentration of the ammonium metavanadate was the single most important factor.
Keywords : Optimization, factorial design, thin film, optical property, vanadium V, oxide xerogel