The Determination of Thermal Annealing Effect on a-Si:H Films Coated on Glass and on Single Crystalline of Silicon

Authors : Necmi SERİN, Tülay SERİN, Ali Rıza ÖZDEMİR, Bora ALKAN

Pages : 53-60

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Publication Date : 0000-00-00

Article Type : Research Paper

Abstract :The aim of this study was to examine the effect of thermal annealing on hydrogenated intrinsic amorphous silicon a-Si:H films. Hydrogenated intrinsic amorphous films were seperately coated on glass and single cyrstalline silicon substrates by means of d.c. magnetron sputtering technique. a-Si:H/glass and a-Si:H/c-Si samples were annealed in the temperature range of 23-250oC, 23-200oC and 600-1050oC, respectively. The effect of annealing on the a-Si:H films were examined by means of Infrared vibrational transmittance spectrum technique insert ignore into journalissuearticles values(IR); in the wavenumber range 4000-400 cm-1 and Scanning Electron Microsope insert ignore into journalissuearticles values(SEM);. The results were interpreted in terms of hydrogen diffusion.
Keywords : Turk J Phys, 26, 2002, 53 60 Turk J Phys, vol 26, iss 1