MICROFABRICATION PROCESS of GRAPHENE FIELD EFFECT DEVICES and INVESTIGATION of LITHOGRAPHIC RESIDUES by SURFACE ENHANCED RAMAN SPECTROSCOPY

Authors : Hidayet ÇETİN

Pages : 6-6

View : 16 | Download : 5

Publication Date : 2016-08-01

Article Type : Research Paper

Abstract :At the fabrication of Graphene Field Effect Transistor insert ignore into journalissuearticles values(GFET);, microfabrication process has been extensively used. Microfabrication process has usually left impurities. However, impurities could be much more important at graphene-like two dimensional systems. In this work, pristine and photolithography-applied graphene samples were investigated by Surface Enhanced Raman Spectroscopy insert ignore into journalissuearticles values(SERS); which is a powerful method to detect molecules even if only one molecule [1- 2]. Furthermore, after the photolithography process, to obtain more clean graphene surface, several methods were applied. The obtained electrical and SERS results were associated and compared to each other’s to propound a new lift-off solvents.
Keywords : Graphene, SERS, Lithographic Residues